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Semiconductor / LCD Processing Equipment

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PHOTO: Link to Link to Polishing Plates

Polishing Plates

High rigidity and chemical resistance maintain surface shape over long periods of time.
  • High Stiffness
  • Wear Resistance
  • Chemical Resistance
  • Wafer Polishing
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PHOTO: Link to Link to SiC (Silicon Carbide) Polishing Plates

SiC (Silicon Carbide) Polishing Plates

Polishing plate with higher thermal conductivity and lower thermal expansion.
  • High Thermal Conductivity
  • Low Thermal Expansion
  • High Stiffness

Other property

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PHOTO: Link to Link to Anti-Plasma Materials

Anti-Plasma Materials

Excellent plasma resistance increases the lifetime of parts.
  • Plasma Resistance
  • Low Dielectric Loss
  • Process Chamber Parts
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PHOTO: Link to Link to Dressing Plates for Polishing Pads

Dressing Plates for Polishing Pads

Excellent anti-wear properties with optional microspikes.
  • Long Lifetime (Wear-resistance)Hv=5000
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PHOTO: Link to Link to Large Parts for LCD Processing Equipment

Large Parts for LCD Processing Equipment

Produces large structural parts with excellent rigidity and precision.
  • High Stiffness
  • Low Reflection
  • Glass Holding
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PHOTO: Link to Link to Domes, Chambers

Domes, Chambers

High purity and excellent plasma resistance increases the lifetime of parts.
  • Plasma Resistance
  • Uniform Electrical Properties
  • Chamber Parts
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PHOTO: Link to Link to Vacuum Chucks, Integrated Mirrors for Stages, Stage Parts

Vacuum Chucks, Integrated Mirrors for Stages, Stage Parts

Transportation parts with high purity and excellent chemical resistance. Various surface shapes available for diverse operational conditions.
  • High Precision
  • Low Thermal Expansion
  • High Specific Rigidity
  • Wafer Holding
  • Transportation
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PHOTO: Link to Link to Electrostatic Chucks (ESCs)

Electrostatic Chucks (ESCs)

High purity, excellent plasma resistance and de-chucking response suitable for a wide range of temperatures.
  • Plasma Resistance
  • Wafer Holding
  • Flatness Correction
  • Cooling
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PHOTO: Link to Link to Heaters

Heaters

High purity with excellent plasma resistance and thermal uniformity.
  • Plasma Resistance
  • High Thermal Conductivity
  • Thermal Uniformity
  • Wafer Heaters
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PHOTO: Link to Link to Handling Arms

Handling Arms

Vacuum adsorption chucking type; various coatings are available.
  • High Heat Resistance
  • Wafer Transportation
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We possess innovative and wide-ranging technologies which can provide customer solutions.

We welcome customized product requests.

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