HeatersHigh-performance heaters utilize high thermal conductivity and plasma resistance.
A wafer heater used in processing chambers, utilizing the high thermal conductivity and plasma resistance of aluminum nitride. It has over 99.9% purity and uniform thermal distribution.
High Thermal Conductivity Plasma Resistance Thermal Uniformity
- Aluminum Nitride
- For φ200/300mm equipment
- Wafer Heaters