PHOTO: Heaters

High-performance heaters utilize high thermal conductivity and plasma resistance

A wafer heater used in processing chambers, utilizing the high thermal conductivity and plasma resistance of aluminum nitride. It has over 99.9% purity and uniform thermal distribution.


  • Plasma Resistance
  • High Thermal Conductivity
  • Thermal Uniformity
We support custom products from prototypes to mass-production runs. Please contact us to explore options, even if your specifications are different from those shown on our Web site.
  • Product specs

Product specs

Material Aluminum Nitride
Size For φ200/300mm equipment
Download catalog

Ceramic Components for Semiconductor Processing(PDF/3.0MB)PDF