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Heaters for Semiconductor Processing Equipment
High-performance heaters utilize high thermal conductivity and plasma resistance.
A wafer heater used in processing chambers, utilizing the high thermal conductivity and plasma resistance of aluminum nitride. It has over 99.9% purity and uniform thermal distribution.
- Property :
- High Thermal Conductivity
- Plasma Resistance
- Thermal Uniformity
Product Data
| Material | Aluminum Nitride |
|---|---|
| Size | For φ200/300mm equipment |
Applications
- Wafer Heaters
