Heaters
High-performance heaters utilize high thermal conductivity and plasma resistance.A wafer heater used in processing chambers, utilizing the high thermal conductivity and plasma resistance of aluminum nitride. It has over 99.9% purity and uniform thermal distribution.
Property
High Thermal Conductivity
Plasma Resistance
Thermal Uniformity
Product specs
- Material
- Aluminum Nitride
- Size
- For φ200/300mm equipment
Applications
- Wafer Heaters